- Plasma Devices
- Non-plasma Devices
Low-energy Ion Source System I The low-energy ion source system I was designed and fabricated in Japan through Doshisha University. |
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Low-energy Ion Source System II | |
Magnetron Sputtering System | |
13.56 MHz RF Plasma System (Low Vacuum) | |
13.56 MHz RF Plasma System (High Vacuum) | |
PECVD System | |
DC Plasma System | |
Microwave Plasma System | |
Magnetized Sheet Plasma System | |
Atmospheric Pressure Plasma Jet |
Vacuum Evaporator | |
Electrospinning System |