- Plasma Devices
- Non-plasma Devices
Low-energy Ion Source System I The low-energy ion source system I was designed and fabricated in Japan through Doshisha University. |
![]() |
Low-energy Ion Source System II | ![]() |
Magnetron Sputtering System | ![]() |
13.56 MHz RF Plasma System (Low Vacuum) | ![]() |
13.56 MHz RF Plasma System (High Vacuum) | ![]() |
PECVD System | ![]() |
DC Plasma System | ![]() |
Microwave Plasma System | ![]() |
Magnetized Sheet Plasma System | ![]() |
Atmospheric Pressure Plasma Jet | ![]() |
Vacuum Evaporator | ![]() |
Electrospinning System |